White light interferometer for mask positioning in lithography

Lithography processes require high resolution and long-term stable measurement of machine movements in order to achieve maximum precision. Thanks to special evaluation algorithms and active temperature compensation, the IMS5400 white light interferometer from Micro-Epsilon enables nanometer-precise positioning of the masks. Vacuum-suitable sensors, cables and cable bushings allow their use in vacuum environments.

MICRO-EPSILON SENSOTEST AB
jakob.geisler@micro-epsilon.se
+46 8 564 733 80